A broadband,antireflective metasurface optic on a silica substrate is subjected to laser-induced damage-threshold measurements to quantify its performance under exposure to high-intensity/fluence laser pulses in the n...A broadband,antireflective metasurface optic on a silica substrate is subjected to laser-induced damage-threshold measurements to quantify its performance under exposure to high-intensity/fluence laser pulses in the near-infrared at four pulse durations,ranging from 20 fs to 1.4 ns.The performance of the metasurface is benchmarked against that obtained from an equivalent bare fused-silica substrate that did not receive reactive-ion-etching metasurface treatment.Results showed that the damage threshold of the antireflective metasurface was always lower than the input-surface damage threshold of the untreated substrate.The damage initiations with nanosecond and picosecond pulses resulted in localized modification and removal of the nanostructures,whereas the onset of laser-induced modification with 20-fs pulses in a vacuum environment manifested as changes in the optical and electronic properties without significant material removal.The broader goal of this work is to develop a preliminary understanding of the laser-induced failure mechanisms of silica-based metasurface optics.展开更多
基金supported by the Department of Energy (National Nuclear Security Administration),University of Rochester‘National Inertial Confinement Program’under Award Number(s) DE-NA0004144
文摘A broadband,antireflective metasurface optic on a silica substrate is subjected to laser-induced damage-threshold measurements to quantify its performance under exposure to high-intensity/fluence laser pulses in the near-infrared at four pulse durations,ranging from 20 fs to 1.4 ns.The performance of the metasurface is benchmarked against that obtained from an equivalent bare fused-silica substrate that did not receive reactive-ion-etching metasurface treatment.Results showed that the damage threshold of the antireflective metasurface was always lower than the input-surface damage threshold of the untreated substrate.The damage initiations with nanosecond and picosecond pulses resulted in localized modification and removal of the nanostructures,whereas the onset of laser-induced modification with 20-fs pulses in a vacuum environment manifested as changes in the optical and electronic properties without significant material removal.The broader goal of this work is to develop a preliminary understanding of the laser-induced failure mechanisms of silica-based metasurface optics.
