High harmonic generation(HHG)enables coherent extreme-ultraviolet(XUV)radiation with ultra-short pulse duration in a table-top setup.This has already enabled a plethora of applications.Nearly all of these applications...High harmonic generation(HHG)enables coherent extreme-ultraviolet(XUV)radiation with ultra-short pulse duration in a table-top setup.This has already enabled a plethora of applications.Nearly all of these applications would benefit from a high photon flux to increase the signal-to-noise ratio and decrease measurement times.In addition,shortest pulses are desired to investigate fastest dynamics in fields as diverse as physics,biology,chemistry and material sciences.In this work,the up-to-date most powerful table-top XUV source with 12.9±3.9mW in a single harmonic line at 26.5 eV is demonstrated via HHG of a frequency-doubled and post-compressed fibre laser.At the same time the spectrum supports a Fourier-limited pulse duration of sub-6 fs in the XUV,which allows accessing ultrafast dynamics with an order of magnitude higher photon flux than previously demonstrated.This concept will greatly advance and facilitate applications of XUV radiation in science and technology and enable photonhungry ultrafast studies.展开更多
Table-top extreme ultraviolet(EUV)microscopy offers unique opportunities for label-free investigation of biological samples.Here,we demonstrate ptychographic EUV imaging of two dried,unstained model specimens:germling...Table-top extreme ultraviolet(EUV)microscopy offers unique opportunities for label-free investigation of biological samples.Here,we demonstrate ptychographic EUV imaging of two dried,unstained model specimens:germlings of a fungus(Aspergillus nidulans),and bacteria(Escherichia coli)cells at 13.5 nm wavelength.We find that the EUV spectral region,which to date has not received much attention for biological imaging,offers sufficient penetration depths for the identification of intracellular features.By implementing a position-correlated ptychography approach,we demonstrate a millimeter-squared field of view enabled by infrared illumination combined with sub-60 nm spatial resolution achieved with EUV illumination on selected regions of interest.The strong element contrast at 13.5 nm wavelength enables the identification of the nanoscale material composition inside the specimens.Our work will advance and facilitate EUV imaging applications and enable further possibilities in life science.展开更多
Microscopy with extreme ultraviolet(EUV)radiation holds promise for high-resolution imaging with excellent material contrast,due to the short wavelength and numerous element-specific absorption edges available in this...Microscopy with extreme ultraviolet(EUV)radiation holds promise for high-resolution imaging with excellent material contrast,due to the short wavelength and numerous element-specific absorption edges available in this spectral range.At the same time,EUV radiation has significantly larger penetration depths than electrons.It thus enables a nano-scale view into complex three-dimensional structures that are important for material science,semiconductor metrology,and next-generation nano-devices.Here,we present high-resolution and material-specific microscopy at 13.5 nm wavelength.We combine a highly stable,high photon-flux,table-top EUV source with an interferometrically stabilized ptychography setup.By utilizing structured EUV illumination,we overcome the limitations of conventional EUV focusing optics and demonstrate high-resolution microscopy at a half-pitch lateral resolution of 16 nm.Moreover,we propose mixed-state orthogonal probe relaxation ptychography,enabling robust phase-contrast imaging over wide fields of view and long acquisition times.In this way,the complex transmission of an integrated circuit is precisely reconstructed,allowing for the classification of the material composition of mesoscopic semiconductor systems.展开更多
基金supported by the Fraunhofer Cluster of Excellence Advanced Photon Sources(CAPS),by the Innovation Pool of the Research Field Matter of the Helmholtz Association of German Research Centers in project(ECRAPS)by APPA R&D:Licht-Materie Wechselwirkung mit hochgeladenen Ionen(13 N12082)+2 种基金by the Thüringer Ministerium für Bildung,Wissenschaft und Kultur(501100004404,2017 FGR 0076)by the Thüringer Aufbaubank(TAB Forschergruppe 2015FGR0094)by the Helmholtz association under grant agreement HGF ExNet-0019-Phase 2-3.
文摘High harmonic generation(HHG)enables coherent extreme-ultraviolet(XUV)radiation with ultra-short pulse duration in a table-top setup.This has already enabled a plethora of applications.Nearly all of these applications would benefit from a high photon flux to increase the signal-to-noise ratio and decrease measurement times.In addition,shortest pulses are desired to investigate fastest dynamics in fields as diverse as physics,biology,chemistry and material sciences.In this work,the up-to-date most powerful table-top XUV source with 12.9±3.9mW in a single harmonic line at 26.5 eV is demonstrated via HHG of a frequency-doubled and post-compressed fibre laser.At the same time the spectrum supports a Fourier-limited pulse duration of sub-6 fs in the XUV,which allows accessing ultrafast dynamics with an order of magnitude higher photon flux than previously demonstrated.This concept will greatly advance and facilitate applications of XUV radiation in science and technology and enable photonhungry ultrafast studies.
基金Strategy and Innovation Grant from the Free State of Thuringia(41-5507-2016)Innovation Pool of the Research Field Matter of the Helmholtz Association of German Research Centers(project FISCOV)+5 种基金Leibniz Research Cluster InfectoOptics(SAS-2015-HKI-LWC)Thüringer Ministerium für Bildung,Wissenschaft und Kultur(2018 FGR 0080)Helmholtz Association(incubator project Ptychography 4.0)Fraunhofer-Gesellschaft(Cluster of Excellence Advanced Photon Sources)German Research Foundation(Deutsche Forschungsgemeinschaft,DFG)under Germany’s Excellence Strategy–EXC 2051–Project-ID 390713860S.H.is supported by the German Research Foundation(Deutsche Forschungs-gemeinschaft,DFG)–SFB 1127/2 ChemBioSys–239748522.
文摘Table-top extreme ultraviolet(EUV)microscopy offers unique opportunities for label-free investigation of biological samples.Here,we demonstrate ptychographic EUV imaging of two dried,unstained model specimens:germlings of a fungus(Aspergillus nidulans),and bacteria(Escherichia coli)cells at 13.5 nm wavelength.We find that the EUV spectral region,which to date has not received much attention for biological imaging,offers sufficient penetration depths for the identification of intracellular features.By implementing a position-correlated ptychography approach,we demonstrate a millimeter-squared field of view enabled by infrared illumination combined with sub-60 nm spatial resolution achieved with EUV illumination on selected regions of interest.The strong element contrast at 13.5 nm wavelength enables the identification of the nanoscale material composition inside the specimens.Our work will advance and facilitate EUV imaging applications and enable further possibilities in life science.
基金supported by the Federal State of Thuringia(2017 FGR 0076)the European Social Fund(ESF)+1 种基金the Thüringer Aufbaubank(TAB)for funding the junior research group HOROS(FKZ:2017 FGR 0076)the European Research Council(ERC)under the European Union’s Horizon 2020 research and innovation programm(grant agreement No.[835306],SALT)。
文摘Microscopy with extreme ultraviolet(EUV)radiation holds promise for high-resolution imaging with excellent material contrast,due to the short wavelength and numerous element-specific absorption edges available in this spectral range.At the same time,EUV radiation has significantly larger penetration depths than electrons.It thus enables a nano-scale view into complex three-dimensional structures that are important for material science,semiconductor metrology,and next-generation nano-devices.Here,we present high-resolution and material-specific microscopy at 13.5 nm wavelength.We combine a highly stable,high photon-flux,table-top EUV source with an interferometrically stabilized ptychography setup.By utilizing structured EUV illumination,we overcome the limitations of conventional EUV focusing optics and demonstrate high-resolution microscopy at a half-pitch lateral resolution of 16 nm.Moreover,we propose mixed-state orthogonal probe relaxation ptychography,enabling robust phase-contrast imaging over wide fields of view and long acquisition times.In this way,the complex transmission of an integrated circuit is precisely reconstructed,allowing for the classification of the material composition of mesoscopic semiconductor systems.
