With a multiplicative speckle model, this paper shows the multi-look polarimetric synthetic aperture radar (SAR) data obeys a generalized K-distribution. To validate this distribution model, the multi-look intensity K...With a multiplicative speckle model, this paper shows the multi-look polarimetric synthetic aperture radar (SAR) data obeys a generalized K-distribution. To validate this distribution model, the multi-look intensity K-distribution is particularly tested. The relationship between the heterogeneity coefficient of the scene and the proper statistical model is experimentally established. In addition, based on the results of the statistical analysis, an adaptive classification scheme is presented, and the improved classification shows the importance of the statistical analysis.展开更多
A discharge-produced-plasma(DPP) source emitting in the extreme ultraviolet(EUV) spectral region is running at the ENEA Frascati Research Centre. The plasma is generated in low-pressure xenon gas and efficiently emits...A discharge-produced-plasma(DPP) source emitting in the extreme ultraviolet(EUV) spectral region is running at the ENEA Frascati Research Centre. The plasma is generated in low-pressure xenon gas and efficiently emits 100-ns duration radiation pulses in the 10–20-nm wavelength range, with an energy of 20 m J/shot/sr at a 10-Hz repetition rate. The complex discharge evolution is constantly examined and controlled with electrical measurements, while a nsgated CCD camera allowed observation of the discharge development in the visible, detection of time-resolved plasmacolumn pinching, and optimization of the pre-ionization timing. Accurately calibrated Zr-filtered PIN diodes are used to monitor the temporal behaviour and energy emission of the EUV pulses, while the calibration of a dosimetric film allows quantitative imaging of the emitted radiation. This comprehensive plasma diagnostics has demonstrated its effectiveness in suitably adjusting the source configuration for several applications, such as exposures of photonic materials and innovative photoresists.展开更多
基金This work was performed at Alenia Spazio, Rome, Italy. It was a part of the cooperation project between Alenia Spazio and University of Electronic Science and Technology of China,Chengdu, China
文摘With a multiplicative speckle model, this paper shows the multi-look polarimetric synthetic aperture radar (SAR) data obeys a generalized K-distribution. To validate this distribution model, the multi-look intensity K-distribution is particularly tested. The relationship between the heterogeneity coefficient of the scene and the proper statistical model is experimentally established. In addition, based on the results of the statistical analysis, an adaptive classification scheme is presented, and the improved classification shows the importance of the statistical analysis.
基金partially funded by the Italian Ministry for University and Research(FIRB project no.RBNE01ABPB)the Cariplo Foundation(project no.2012-0816)
文摘A discharge-produced-plasma(DPP) source emitting in the extreme ultraviolet(EUV) spectral region is running at the ENEA Frascati Research Centre. The plasma is generated in low-pressure xenon gas and efficiently emits 100-ns duration radiation pulses in the 10–20-nm wavelength range, with an energy of 20 m J/shot/sr at a 10-Hz repetition rate. The complex discharge evolution is constantly examined and controlled with electrical measurements, while a nsgated CCD camera allowed observation of the discharge development in the visible, detection of time-resolved plasmacolumn pinching, and optimization of the pre-ionization timing. Accurately calibrated Zr-filtered PIN diodes are used to monitor the temporal behaviour and energy emission of the EUV pulses, while the calibration of a dosimetric film allows quantitative imaging of the emitted radiation. This comprehensive plasma diagnostics has demonstrated its effectiveness in suitably adjusting the source configuration for several applications, such as exposures of photonic materials and innovative photoresists.
