Thin amorphous films of Carbon have been deposited by DC S-gun magnetron sputtering using a graphite.The thickness of films in the range of 100 to 200nm were depositod over a pressure range of 0.4 to 8.0 mtorr (Ar fio...Thin amorphous films of Carbon have been deposited by DC S-gun magnetron sputtering using a graphite.The thickness of films in the range of 100 to 200nm were depositod over a pressure range of 0.4 to 8.0 mtorr (Ar fiow rate in range 1.0 to 20 sccm)on SiO2 and Si substrates. The structure and properties of carbon were studied by four point probe, profilometer, automatic ellipsometer,X-ray diffraction, AES, SEM and electron energy-loss spectroscapy (EELS).The electrical resistivity of a-C films was reduced from about 2.5 Ωcm at 8.0 mTorr pressure to a value 1.6E-2Ωcm at 0.4 mTorr pressure.The index of refraction increased from 2.4 at 0.SmTorr to 1.7 at 8.0 mTorr.It has been shown from results that the structure and properties of sputtered carbon films are strongly influenced by the condition of deposition procoss.展开更多
文摘Thin amorphous films of Carbon have been deposited by DC S-gun magnetron sputtering using a graphite.The thickness of films in the range of 100 to 200nm were depositod over a pressure range of 0.4 to 8.0 mtorr (Ar fiow rate in range 1.0 to 20 sccm)on SiO2 and Si substrates. The structure and properties of carbon were studied by four point probe, profilometer, automatic ellipsometer,X-ray diffraction, AES, SEM and electron energy-loss spectroscapy (EELS).The electrical resistivity of a-C films was reduced from about 2.5 Ωcm at 8.0 mTorr pressure to a value 1.6E-2Ωcm at 0.4 mTorr pressure.The index of refraction increased from 2.4 at 0.SmTorr to 1.7 at 8.0 mTorr.It has been shown from results that the structure and properties of sputtered carbon films are strongly influenced by the condition of deposition procoss.
