The electric-pulse-induced resistive switching effect is studied for Tio.s5Cro.15Ox （TCO） films grown on Ir-Si substrates by pulsed laser deposition. Such a TCO device exhibits bipolar switching behaviour with an el...The electric-pulse-induced resistive switching effect is studied for Tio.s5Cro.15Ox （TCO） films grown on Ir-Si substrates by pulsed laser deposition. Such a TCO device exhibits bipolar switching behaviour with an electric-pulse- induced resistance ratio as large as about 1000% and threshold voltages smaller than 2 V. The resistive switching characteristics may be understood by resistance changes of a Schottky junction composed of a metal and an n-type semiconductor, and its nonvolatility is attributed to the movement of oxygen vacancies near the interface.展开更多
基金Project supported by NASA,the State of Texas through the Center for Advanced Materials,Sharp Laboratories of America,Semiconductor Research Corporation,the R.A.Welch Foundation (Grant No.#E-632)the National Natural Science Foundation of China (Grant No.11074109)+2 种基金the Natural Science Foundation of Jiangsu Province of China (Grant No.SBK200920627)the National Basic Research Program of China (Grant No.2010CB923404)the National "Climbing" Program of China (Grant No.91021003)
文摘The electric-pulse-induced resistive switching effect is studied for Tio.s5Cro.15Ox （TCO） films grown on Ir-Si substrates by pulsed laser deposition. Such a TCO device exhibits bipolar switching behaviour with an electric-pulse- induced resistance ratio as large as about 1000% and threshold voltages smaller than 2 V. The resistive switching characteristics may be understood by resistance changes of a Schottky junction composed of a metal and an n-type semiconductor, and its nonvolatility is attributed to the movement of oxygen vacancies near the interface.
