摘要
本文通过引拉法测定不锈钢靶材磁控溅射薄膜的结合力,获得了不锈钢靶材的磁控溅射最佳工艺参数,其值为:基材加热温度:800℃,氩压:4×10^(-3)Torr;偏压:-200V;溅射时间:1(?)～2.0h。
The bond of magneti(?) control sputtering film was determined from stainless steel target material by drawing method, having obtained optimum process parameter of the magnetic control sputtering, with the heating temperature of 800℃, aron pressure of 4×10^(-3) Torr, piasing voltage of —200V and the sputtering time of 1.0 to 2.0 hrs.
出处
《表面技术》
EI
CAS
CSCD
1989年第4期7-11,共5页
Surface Technology
