摘要
本文报道用激光诱导表面化学反应沉积金属膜的一种新实验结果。用OWCO_02激光诱导硅片表面的Ni_2O_3与硅片衬底反应沉积镍膜,一步形成Ni-SiO_2-Si的准MOS结构。用多种表面分析方法对膜层的成份,性能进行测试分析,并讨论了膜的生长机制。
New experimental results of depositing metal mm by faser- induced surface chemical reaction is reported. By CW CO2 laser illumination, the rtaction between Ni2O3 on silicon surface and silicon substrate was induced, Nickel film was deposited on silicon surface, and a quasi MOS structural film of Ni-SiO2-Si was formed by one step teratment. AES, X-ray diffraction, BBS, square resistance meter etc. were taken to analyze the composition and the characteristics of the film and the mechanism of its growth was discussed.
出处
《中国激光》
EI
CAS
CSCD
北大核心
1990年第2期95-98,共4页
Chinese Journal of Lasers
基金
国家自然科学基金资助项目
