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GEM膜的化学刻蚀与性能测试

Fabricating Optimum and Quality Test of Gas Electron Multiplier Based on Chemical Etching
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摘要 分析了化学蚀刻制作GEM膜过程中影响蚀刻质量的实验因素,并对相关的蚀刻条件进行了优化,制作出了8张灵敏面积为4×4cm2,孔径为85μm,孔间距为140μm的GEM膜并用其中的3张搭建了探测器。利用55Fe的X射线(5.9keV)测试探测器性能,结果显示,能量分辨率约为26%,有效增益可达105。 With a thorough analysis of the main factors in chemical etching process, which affect amplifying characteristics of GEM foil, experiments of optimization are carried out. GEM foils of an active area of 4cm×4cm with holes of 85μm radii and pitches of 140μm were obtained. A detector of triple GEM was assembled, whose energy resolution is 26 % (@5.9KeV). Its effective electron gain is 105 in the gas mixture of argon and carbon dioxide.
出处 《核电子学与探测技术》 CAS CSCD 北大核心 2009年第5期1214-1217,共4页 Nuclear Electronics & Detection Technology
关键词 GEM 化学刻蚀 漏电流 有效增益 能量分辨率 GEM, chemical etching, leakage, effective multiplication, energy resolution
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  • 1F. Sauli, Nucl. Instr. and Meth. 1997,A 386:531-534.
  • 2来永芳,李玉兰,李元景,李金,郑晓翠,曹良俊.三级GEM气体探测器性能的实验研究[J].高能物理与核物理,2006,30(8):767-770. 被引量:3
  • 3F. Sauli, Nucl. Instr. and Meth. 2003,A 505:195 - 198.
  • 4S.X. Oda, et al. , Nucl. Instr. and Meth. 2006,A 566 : 312-320.
  • 5S. Bachmann, et al., Nucl. Instr. and Meth. 2002,A 478 : 104-108.
  • 6A. Brahme, et al. , Nucl. Instr. and Meth. 2000,A 454 : 136.
  • 7The Gas Detecors Development Group at CERN: http://gdd, web. cern ch/GDD/.
  • 8P. S. Barbeau, et al. , Instr. and Meth. 2003, A 515 : 439-455.
  • 9http://www, tech-etch, com/flex/21ayer, html.
  • 10M. Inuzuka, et al., Nucl. Instr. and Meth. 2004, A 525 : 529-534.

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