摘要
采用磁控溅射技术在玻璃基片上制备了W掺杂的非晶态TiO2薄膜,用XRD、XPS和椭圆偏光测厚仪等对薄膜进行了微观分析.结果表明,TiO2-W薄膜为非晶态结构.Ti以+4价存在;W以0价和+6价形式存在,并且6价和0价W的原子浓度比为6.4∶1;薄膜中Ti和W的原子浓度比为2.6∶1.对5mg·L-1的亚甲基蓝溶液光催化脱色试验表明,随着膜厚的增加,光催化降解率递增,当膜厚达到141nm时,所制备的TiO2-W薄膜对亚甲基蓝的脱色率在2h达到90%;当膜厚大于141nm时,光催化降解率不再增加.
The tungsten-doped titanium oxide thin films have been deposited on slides by magnetron sputtering. XRD , XPS and Ellipsometric examination were used to analyze micro properties of the films. The results of XRD show that TiO2-W films are amorphous. While the results of XPS show that Ti in the films are TiO2 structure. W in the films has two forms-WO3 and simple substance, and the ratio of two forms is 6.4：1. The atomic proportion of Ti and W is 2.6：1. The results of photodegrading methylene blue which concentration is 5 mg·L^-1 show that with the thickness of the film increasing the rate of photodegradation rises. And when the thickness of the film is 141 nm, the rate of photodegradation is 90% in 2 hours. And when the thickness of the film is over 141 nm, the rate of photodegradation doesn＇t increase.
出处
《环境科学学报》
CAS
CSCD
北大核心
2006年第4期620-625,共6页
Acta Scientiae Circumstantiae
基金
重庆大学新型建筑材料重点实验室创新实验项目资助~~
关键词
磁控溅射
TiO2-W薄膜
光催化
薄膜厚度
magnetron sputtering, TiO2-W thin films, photocatalysis, film thickness
