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SiC肖特基接触的直接隧穿效应 被引量:5

Direct Tunneling Effect in SiC Schottky Contacts
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摘要 通过精确求解一维定态薛定谔方程得到电子通过三角形势垒的隧穿几率,模拟了SiC肖特基接触的直接隧穿效应.结果显示该方法比WKB近似更精确,同时也更适合工作在高场条件下的SiC材料,并且能够连续地计算热电子发射电流和隧穿电流. The direct tunneling effect in SiC Schottky contacts is simulated based on electron tunneling probabilities through a triangular barrier, which are accurately solved using the one-dimensional time-independent Schroedinger equation. The simulation results show that the proposed method has the advantages of greater accuracy and adaptability to SiC Schottky contacts in high fields over the WKB approximation. It also can seamlessly treat thermionic emission and tunneling current.
出处 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2006年第1期174-177,共4页 半导体学报(英文版)
基金 国家自然科学基金资助项目(批准号:J60404250140)~~
关键词 SiC肖特基接触 直接隧穿 WKB近似 SiC Schottky contact direct tunneling WKB approximation
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参考文献7

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同被引文献35

  • 1王小平,王丽军,张兵临,姚宁,张启仁,陈俊,段新超.An Effective Method for Improvement of Field Electron Emission Site Density and Uniformity of Amorphous Carbon Thin Films[J].Chinese Physics Letters,2006,23(5):1314-1316. 被引量:2
  • 2陈刚,李哲洋,柏松,任春江.Ti/4H-SiC Schottky Barrier Diodes with Field Plate and B^+ Implantation Edge Termination Technology[J].Journal of Semiconductors,2007,28(9):1333-1336. 被引量:2
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  • 9Guo Hui, Zhang Yimen, Zhang Yuming. Evidence of the Role of Carbon Vacancies in Nickel Based Ohmic Contacts to N- type Silicon Carbide [J]. Chinese Journal of Semiconductors, 2007, 28(1) : 5-9.
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