期刊文献+

TiO_2 Thin Film UV Detectors Deposited by DC Reactive Magnetron Sputtering 被引量:1

TiO_2 Thin Film UV Detectors Deposited by DC Reactive Magnetron Sputtering
在线阅读 下载PDF
导出
摘要 Crystalline TiO2 thin films were prepared by DC reactive magnetron sputtering on indium-tin oxide(ITO) thin film deposited on quartz substrate, the photoconductive UV detector on TiO2 thin films was based on a sandwich structure of C/ TiO2/ITO. The measurement of the I-V characteristics for these devices shows good ohmic contact. The photoresponse of TiO2 thin films was analyzed at different bias voltage. The detector shows a good photoresponse with a rise time of 2 s and a fall time of 40 s, the photocurrent is linearly increased with the bias voltage. Crystalline_( )TiO_(2) thin films were prepared by DC reactive magnetron sputtering on indium-tin oxide(ITO) thin film deposited on quartz substrate, the photoconductive UV detector on TiO_(2) thin films was based on a sandwich structure of C/ TiO_(2)/ITO. The measurement of the I-V characteristics for these devices shows good ohmic contact. The photoresponse of TiO_(2) thin films was analyzed at different bias voltage. The detector shows a good photoresponse with a rise time of 2 s and a fall time of 40 s, the photocurrent is linearly increased with the bias voltage.
机构地区 KeyLab.ofMater.Phys.
出处 《Semiconductor Photonics and Technology》 CAS 2004年第4期245-247,共3页 半导体光子学与技术(英文版)
关键词 TiO_(2) thin films SPUTTERING Photoconductive UV detector PHOTORESPONSE ITO TiO2 DC UV 氧化钛 紫外线
  • 相关文献

参考文献8

  • 1[1]Razeghi M, Rogalski A. Semiconductor ultraviolet detectors[J]. J. Appl. Phys., 1996,79: 7 433-7 473.
  • 2[2]Irrera F, De Cesare G, Iorio V, et al. Amorphous silicon UV photodetectors with rejection of the visible spectrum[J]. J. Non-Crystalline Solids., 1996, 198-200: 1 198-1 201.
  • 3[3]Nowak Z, Piotrowski J, Dobrzanski L. Micromachined silicon bolometers as detectors of soft X-ray, ultraviolet, visible and infrared radiation[J].Sensors and Actuators A: Physical 1997, 60: 154-159.
  • 4[4]Hiscock J, Collins A T. Comparison of diamond and silicon ultraviolet photodetectors[J]. Diamond and Related Materials. 1999, 8: 1 753-1 758.
  • 5[5]Ferguson I, Tran C A, Karlicek Jr R F, et al. GaN and AlGaN metal semiconductor metal photodetectors[J]. Materials Science and Engineering: B, 1997,50: 311-314.
  • 6[6]Kazuo S, Takayuki O, Norihiko S, et al. Surface characterization of titanium dioxide powder treated by the CH4-H2 plasma CVD method[J]. Surface and Coatings Technology, 2003, 174-175: 882-885.
  • 7[7]Phonthammachai N, Chairassameewong T, Gulari E, et al. Structural and rheological aspect of mesoporous nanocrystalline TiO2 synthesized via sol gel process[J]. Microporous and Mesoporous Materials, 2003, 66 : 261-271.
  • 8[8]Kim Seon-Hwa, Choi Yong-Lak, Seung Yo, et al. Influence of sputtering parameters on microstructure and morphology of TiO2 thin films[J]. Materials Letters, 2002, 57: 343-348.

同被引文献6

引证文献1

二级引证文献4

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部